Semiconductor Polymer Integrated Fabrication Facility CLEANROOM WHAT

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Semiconductor/ Polymer Integrated Fabrication Facility CLEANROOM

WHAT TO EXPECT (OUTLINE) • • Why a cleanroom? What is it? Facilities Procedures

WHY? • IT’S A DIRTY WORLD! – UNCOUNTABLE PARTICLES IN AIR – ALL SIZES, SHAPES, PROPERTIES • NANOTECH – S MA L L – FRAGILE LLL

WHAT is a cleanroom? • A room, enclosure, and or environment in which you move the air by way of supply and return locations to control the airborne particle levels and in some cases temperature and humidity. • A place where harmful junk is kept away from sensitive items or materials. Courtesy of http: //www. mcr-1. com/definitions. html

CLEANROOM CLASSIFICATION Class limits [maximum allowable particles per cubic foot (SI/209) or meter (ISO)] ISO SI Fed Std 209 0. 1 micron 0. 2 micron 0. 3 micron 0. 5 micron 3 M 1 1 100 35 M 1. 5 1 35 M 2 10 99. 1 4 M 2. 5 10 10, 000 345 M 3 100 991 5 M 3. 5 100, 000 3, 450 750 300 3520 100 0 6 M 4. 5 1, 000, 000 34, 500 N/A 35, 200 1, 000 7 7 M 5. 5 10, 000 345, 000 N/A 352, 000 10, 000 70 8 M 6. 5 100, 000 3, 450, 000 N/A 3, 520, 000 100, 000 7 35 1 5 micron 3 1 75 2. 83 30 0 352 10 28. 1 0 Courtesy of http: //www. mcr-1. com/class. html

CLEANROOM FACILITIES Class 10, 000 by airflow design Upgradable to Class 1, 000 Tested (empty) as Class 1, 000 (~780 actual counts) 2003 July 15

ENTRY INTO THE CLEAN WORLD >>> STOP <<< NO FOOD OR BEVERAGES BEYOND THIS POINT

STAY ON THE MATS PAST THIS POINT

SHOES OR BOOTIES Booties Shoes

NOW YOU CROSS THE LINE

CHEMICAL PREPARATION Solvents Acids

THE CLEANROOM

THE GOWNING ROOM • Follow the sequence of bouffant (hairnet), shoe covers, gloves, and frock. • If you are only stepping out for a short time reuse the same items. • If you are carrying something into the cleanroom wipe it down with the presoaked wipes. • The reason for gowning is to expose a minimum of flaking skin, hair, etc. that could harm your work.

CLEANROOM ENTRANCE

GOWNING STEPS REVERSE THE STEPS WHEN REMOVING THE APPAREL

COMMON GOWNING ERRORS • • Hair protruding from bouffant. Ears not covered. Open collar on frock. Gloves rolled up and/or frock sleeves pulled back from gloves. The gloves should be fully extended up the forearms. • Once again, the reason for gowning is to expose a minimum of flaking skin, hair, etc. that could harm your work.

WHITE ROOM • 4’ Fume Hood • In process of obtaining additional equipment. – Reactive Ion Etcher – Deposition System(s) • Will be adding Emergency Eye Wash / Shower.

WHITE ROOM Acid

YELLOW ROOM • Exhausted Laminar Flow Hood – Photolithography • Sink, Spinner, Hot Plate, Oven – ISO 5 (Class 100) environment • Vertical Laminar Flow Hood – MJB 3 Mask Aligner – Microscope – ISO 5 (Class 100) environment • If the room is occupied use the telephone’s intercomm from the White Room to verify it’s safe to open the door and enter.

YELLOW ROOM

PHOTOLITHOGRAPHY Sink I Spinner I Contaminate Waste I Oven & Hot Plate

HORIZONTAL LAMINAR HOOD Microscope (No DIC) I OLD Mask Aligner I MJB 3 Mask Aligner I

MASK ALIGNER MUST be trained before use

MICROSCOPE MUST be trained before use

CHARACTERIZATION HALL • X-rays – Scintag X’tr. A XRD: powder/low angle – Philips XRD: High Resolution • Wiring Stations – Ball Bonder – Indium Soldering Station • Horizontal Laminar Flow Hood – p. H – Anodization Station • Optical Tables (a work in progress) – Mid-IR Photoluminescence • C-V Analysis • Coming Soon – FIB – Hall Effect

X-RAYS Philips XRD Scintag X’tr. A XRD

WIRING STATIONS Home Built Indium Soldering Station MEI 1204 B Ball Bonder

p. H and ANODIZATION Anodization I p. H I

SOME GENERAL INFO • You must be trained before using it unassisted. • Clean up and put away. – Leaving your work area in better condition than you found it is a good habit to develop. • If you have any doubts or questions, ASK. – Harm to you and / or equipment can result from improper procedures. • Using / operating available facilities / equipment is a privilege not a right. – Your privilege can be restricted or revoked if you refuse to follow accepted practices or rules.

Some Useful References • UCLA Nanoelectronics Research Facility – http: //nanolab. ucla. edu/new_users. htm – http: //nanolab. ucla. edu/pdf/Orient. ppt • University of California at Berkeley – http: //microlab. berkeley. edu/ • Georgia Tech – http: //www. mirc. gatech. edu/facilities/ • University of Alabama in Huntsville – http: //www. licos. uah. edu/nmf. html • Cornell Nanofabrication Facility – http: //www. cnf. cornell. edu/cnf/CNFSafety. Manual 8. html

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