Objective 8 7 Molecular Scale Devices and

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Objective 8. 7: « Molecular Scale Devices and Systems » ICT Call 6 FP

Objective 8. 7: « Molecular Scale Devices and Systems » ICT Call 6 FP 7 -ICT-2009 -6 ATOMIC SCALE AND SINGLE MOLECULE LOGIC GATE TECHNOLOGIES (January 2011 - December 2014) Coordinator: C. Joachim Project Number : 270028

Atome-molécule « Concept Chip » 100 mm 40 nm

Atome-molécule « Concept Chip » 100 mm 40 nm

Participant no. Participant organisation name Part. short name Country 1 (Coordinator) CEMES-CNRS P 1

Participant no. Participant organisation name Part. short name Country 1 (Coordinator) CEMES-CNRS P 1 -Toulouse FRANCE 2 LETI-CEA P 2 -Grenoble FRANCE 3 PHANTOMS FOUNDATION P 3 -Madrid SPAIN 4 ICIQ Tarragona P 4 -Tarragona SPAIN 5 CSIC Barcelona P 5 -Barcelona SPAIN 6 MPG - FRITZ HABER INSTITUT BERLIN P 6 -FHBerlin GERMANY 7 HUMBOLDT UNIVERSITY BERLIN P 7 -HUBerlin GERMANY 8 TU DRESDEN P 8 -Dresden GERMANY 9 UNIVERSITY OF NOTTINGHAM P 9 -Nottingham UNITED KINGDOM 10 JAGIELLONIAN UNIVERSITY KRAKOW P 10 -Krakow POLAND 11 IMRE A*STAR P 11 -Singapore SINGAPORE Total budget: 9 642 K€ + 4 000 K€ EU: 6 899 K€

Atom Tech Process Flow

Atom Tech Process Flow

100. 8 nm 3 nm Si(100) 2 x 1 LT-UHV STM 100 p. A,

100. 8 nm 3 nm Si(100) 2 x 1 LT-UHV STM 100 p. A, -2. 5 V

Atom Tech Process Flow

Atom Tech Process Flow

Interconnexion face arrière (compatible UHV)

Interconnexion face arrière (compatible UHV)

Atom Tech Process Flow

Atom Tech Process Flow

41. 4 nm Surface contacting nano pads 108 Si. H dimers in width

41. 4 nm Surface contacting nano pads 108 Si. H dimers in width

100 nm UHV STM Mo. S 2 A UHV SEM Si(100)H UHV Transfer Printer

100 nm UHV STM Mo. S 2 A UHV SEM Si(100)H UHV Transfer Printer B 10 nm 15 0 10 20 30 40 0 50 Pa TEM cross section

Atom Tech Process Flow

Atom Tech Process Flow

Design à l’échelle atomique? ?

Design à l’échelle atomique? ?

Molecule NOR gate Au Au Au ACS Nano, 5 , 1436 (2011) 4 nm

Molecule NOR gate Au Au Au ACS Nano, 5 , 1436 (2011) 4 nm x 4 nm

Molecule NOR gate Au Au Au ACS Nano, 5 , 1436 (2011) 4 nm

Molecule NOR gate Au Au Au ACS Nano, 5 , 1436 (2011) 4 nm x 4 nm

Atom Tech Process Flow

Atom Tech Process Flow

Atom Tech Process Flow

Atom Tech Process Flow

P 10 (Krakow) and P 11 (Singapore) Atomic scale interconnection machine

P 10 (Krakow) and P 11 (Singapore) Atomic scale interconnection machine

Omicron UHV LT 4 STM system

Omicron UHV LT 4 STM system

4 UHV-STM tips positionned under an UHV SEM

4 UHV-STM tips positionned under an UHV SEM

4 STM tip in UHV on Mo. S 2

4 STM tip in UHV on Mo. S 2

30 nm Au nano-islands on Mo. S 2

30 nm Au nano-islands on Mo. S 2

17 nm 10 nm 15 0 0 10 20 30 40 50

17 nm 10 nm 15 0 0 10 20 30 40 50

P 1 (Toulouse (Pico. Lab / CEMES-CNRS) ) Atomic scale Interconnection machine DUF

P 1 (Toulouse (Pico. Lab / CEMES-CNRS) ) Atomic scale Interconnection machine DUF

Atom Tech Process Flow

Atom Tech Process Flow

Atome-molécule « Concept Chip »

Atome-molécule « Concept Chip »

Objective 8. 7: « Molecular Scale Devices and Systems » Thanks for your attention

Objective 8. 7: « Molecular Scale Devices and Systems » Thanks for your attention Proposal Number : 270028 ICT Call 6 FP 7 -ICT-2009 -6

Charge utile Système de Guidage Autonetics D 17 1521 transistors, 6282 diodes 28 kg

Charge utile Système de Guidage Autonetics D 17 1521 transistors, 6282 diodes 28 kg Minuteman I 1962

Horloges atomiques

Horloges atomiques

Horloge atomique Giove B 2007 18 kg 1 ns/jour

Horloge atomique Giove B 2007 18 kg 1 ns/jour

Horloge atomique J. Kitching Puce à atomes NIST 2004 75 m. W, 1 s/300

Horloge atomique J. Kitching Puce à atomes NIST 2004 75 m. W, 1 s/300 ans Vapeur de Rb

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