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Filtek™ LS Low Shrink Posterior Restorative System Filtek™ LS Low Shrink Posterior Restorative System

Filtek™ LS Low Shrink Posterior Restorative System § Less than 1% shrinkage 1 § Filtek™ LS Low Shrink Posterior Restorative System § Less than 1% shrinkage 1 § Reduced stress and improved marginal integrity § Extended operatory light stability § A remarkable 9 minutes of working time § Ideal handling § Non-sticky, easier manipulation during placement, and ideal sculptability § Silorane technology § Low shrinkage is achieved by using a novel ring-opening chemistry, called silorane. § Used with dedicated 3 M™ ESPE™ LS System Adhesive § Available in 4 shades (A 2, A 3, B 2, C 2) with excellent chameleon effect 1 <1% volumetric shrinkage tested by bonded-disc method

Polymerization Stress vs. Shrinkage Polymerization Stress (MPa) 20 Grandio® Spectrum® TPH® Qui. XX™ P Polymerization Stress vs. Shrinkage Polymerization Stress (MPa) 20 Grandio® Spectrum® TPH® Qui. XX™ P 60 Ceram. X™ Premise™ Herculite™ Charisma™ XRV 15 Tetric Evo. Ceram® 10 Advantages 5 Watts et al. 0 0. 5 % Filtek™ LS Reduced polymerization shrinkage and stress can lower the risk of marginal staining, post-operative sensitivity, secondary caries, microleakage and debonding. 1. 0% 1. 5% 2. 0% 2. 5% Shrinkage (Vol. %) Stress method: Bloman; shrinkage method: bonded-disc. Source: University of Manchester 3. 0%

Polymerization Stress Silorane Chemistry Methacrylate Chemistry High Stress 50 Low Qui. XX™ Stres s Polymerization Stress Silorane Chemistry Methacrylate Chemistry High Stress 50 Low Qui. XX™ Stres s Finite element analysis of polymerization stress. Source: University of Minnesota. Filtek™ LS

Operatory Light Stability Advantages § Increased working time § Ability to use operatory light Operatory Light Stability Advantages § Increased working time § Ability to use operatory light directly § Improved visibility in the posterior can lead to better marginal adaptation § Flexibility and easy placement Method: ISO 4049, Source: 3 M ESPE, internal data

Placement of Filtek™ LS Posterior Restorative 3 M™ ESPE™ Filtek LS Self-Etch Primer § Placement of Filtek™ LS Posterior Restorative 3 M™ ESPE™ Filtek LS Self-Etch Primer § § § Apply with agitation for 15 sec Air dry Light cure for 10 seconds 3 M™ ESPE™ LS System Adhesive Bond § § § Apply Air thin if desired Light cure for 10 seconds Filtek™ LS Restorative § § § Incremental placement is indicated; depth of cure is 2. 5 mm Excellent operatory light stability allows additional time for manipulation Light-cure each increment as indicated (20 seconds for LED over

Clinical Results of Filtek™ LS Posterior Restorative Photos courtesy of Dr. Gabriel Krastl Clinical Results of Filtek™ LS Posterior Restorative Photos courtesy of Dr. Gabriel Krastl

Filtek™ LS Low Shrink Posterior Restorative System § Filtek™ LS Posterior Restorative could help Filtek™ LS Low Shrink Posterior Restorative System § Filtek™ LS Posterior Restorative could help increase patient satisfaction, improve restorative success, and increase practice productivity § Two ways to try Filtek™ LS Posterior Restorative System ü Trial Kit (4901 TK & 4902 TK) ü Risk Free Try & Buy (4901 TB & 4902 TB)- Available 6/2008