- Количество слайдов: 21
• CVD fundamentals (gas-phase and surface chemistry, reaction mechanisms, kinetics, multi-scale modeling, structure-property relationships) • Novel CVD precursors: design, development and characterization • Innovative CVD strategies (activated processes, plasma-assisted, ALD, i. CVD, hybrid strategies) • Non-conventional materials and complex structures by CVD (nanorods and tubes, nanocomposites, nanopillars, nanoparticles and quantum dots) • Process control and diagnostics - in-situ spectroscopy and analytical techniques • Novel processing tools and reactors: CVD from the lab to the fab • Technological applications of CVD techniques (optoelectronics, chemical sensors, energy production, photocatalysis, MEMS devices, etc. )
2007 2009 (44 симпозиума) ALD – 12 докладов Symposium: Atomic Layer Deposition Applications Hf. O 2 films Symposium: High Dielectric Constant Materials and Gate Stacks
Сессии 7 -9: Industrial and New Application Industrial Applications of Atomic Layer Deposition Mikko Ritala and Jaakko Niinistц Department of Chemistry, University of Helsinki, Finland -35 лет развития ALD (20 лет использования в промышленности)
Schematics and photos of displays. The luminescent Zn. S: Mn (about 1μm in thickness), insulating Al 2 O 3 or Alx. Tiy. O (about 200 nm each) as well as protective and passivating Al 2 O 3 layers are produced by ALD.
a) б) г) в) Microlens array with a diameter and pitch of 10 μm obtained by conformal deposition of 4. 8 μm thick Si. O 2 layer onto the template shown in (a).
Batch ALD reactor used in depositing an antitarnishing layer on 2000 silver jewelry pieces in a one process (Copyright Beneq Oy, Finland).
Large Area PECVD Technology Soo Young Choi, John M. White AKT, an Applied Materials company, Santa Clara, California 95054, USA The rapid growth of the Active Matrix Liquid Crystal Display market since the late 1990’s has been driven by demand for ever larger displays that are widely affordable. Therefore, LCD manufacturers have steadily driven their industry toward lower and lower manufacturing cost per unit area of display. The current generation, Generation 10, which is just starting, is based on a glass substrate that’s over 9 m 2 in size. - high-quality PECVD layers at high rates on such large substrates.
AKT 90 K PECVD system The processing chambers can be outfitted to deposit amorphous-Si (α-Si), doped α-Si, microcrystalline-Si (μc-Si), doped μc-Si, Si. Nx, Si. ON and Si. Ox films for either thin film transistor or thin film solar cell manufacturing.
The schematic view of Sun. Fab™ T-J thin film solar cell production line
Controlled Synthesis Of Carbon Nanotubes By Various CVD And PECVD Methods Mihnea Ioan Ionescu a, Hao Liu a, Yu Zhong a, Yong Zhang a, Ruying Li a, Xueliang Sun a* Jean-Baptiste A b. Kpetsu b, Claude Côté b, Pawel Jedrzejowski b, Andranik Sarkissian b* Philippe Mérel c*, Philips Laou c, Suzanne Paradis c, Sylvain Désilets c a Department of Mechanical and Materials Engineering, The University of Western Ontario, London, Ontario, Canada, N 6 A 5 B 8 b Plasmionique Inc. , 1650 boul. Lionel Boulet, Varennes (Québec), Canada, J 3 X 1 S 2 c Defense Research & Development Canada - Valcartier, 2459 boul. Pie XI Nord, Québec (Québec), Canada, G 3 J 1 X 5 1. 2. 3. 4. 5. 6. 7. Joule-heating CVD, floating catalyst CVD, conventional thermal CVD, aerosol-assisted CVD, spray pyrolysis CVD, radio frequency plasma enhanced CVD (PECVD) microwave plasma enhanced CVD These studies are expected to pave the way to develop strategies for controlled synthesis of CNTs tailored for specific applications, including sensors and nanodevices.
1. Joule-heating CVD Figure 1 Schematic diagram of the Joule-heating CVD set-up Figure 2 SEM images of the carbon paper (a) before and (b) after growth of CNTs, and relative (c)TEM images of the synthesized CNTs
Floating catalyst CVD Figure 4 (a) SEM and (b)TEM image of the CNTs via FCCVD
Conventional thermal CVD
Spray pyrolysis CVD
Radio frequency plasma enhanced CVD (PECVD)
Microwave plasma enhanced CVD TEM A typical example of SEM, AFM TEM images of CNTs synthesized at 750 o. C, with a Ni Catalyst thickness of about 4 nm using MWPECVD technique SEM AFM
Conclusions Carbon nanotubes have been synthesized by different chemical vapor deposition techniques, including Joule-heating CVD, floating catalyst CVD, conventional thermal CVD, aerosol assisted CVD, spray pyrolysis CVD and plasma enhanced CVD methods. Influence of different techniques on the CNTs growth has been discussed briefly. • Joule-heating CVD is primary candidate, when carbon paper is employed as the substrate; • floating catalyst CVD is the simplest CVD method for CNTs synthesis. • Conventional thermal CVD promises a narrow diameter distribution of CNTs; • Aerosol assisted CVD offer a superior performance for the synthesis of multi-component products with precise stoichiometric control; • spray pyrolysis CVD is an effective synthesis route for large-scale CNTs production; • plasma enhanced CVD shows overwhelming advantages of control orientation and alignment of the CNTs array, as well as their control on a nanometer scale. By selecting appropriate techniques, growth of CNTs is expected to be tailored, which would enhance their potential for producing different nanodevices.